J. Phys. Chem. B 109 (2005) 6343-6354.
Inner-Shell Excitation Spectroscopy and X-ray
Photoemission Electron Microscopy of Adhesion Promoters
David Tulumello, Glyn Cooper, Ivo Koprinarov, and Adam P. Hitchcock
Department of Chemistry, McMaster UniVersity, Hamilton, Ontario L8S 4M1, Canada
Edward G. Rightor, Gary E. Mitchell, Steve Rozeveld, Greg F. Meyers, and Ted
M. Stokich
The Dow Chemical Company, 1897 Building, Midland, Michigan 48667, and Advanced
Electronic Materials, The Dow Chemical Company, 1712 Building, Midland, Michigan
48674
Received: January 11, 2005
The C 1s, Si 2p, Si 2s, and O 1s inner-shell excitation spectra
of vinyltriethoxysilane, trimethylethoxysilane, and vinyltriacetoxysilane have
been recorded by electron energy loss spectroscopy under scattering conditions
dominated by electric dipole transitions. The spectra are converted to absolute
optical oscillator strength scales and interpreted with the aid of ab initio
calculations of the inner-shell excitation spectra of model compounds. Electron
energy loss spectra recorded in a transmission electron microscope on partly
cured adhesion promoter, atomic force micrographs, and images and X-ray absorption
spectra from X-ray photoemission electron microscopy of as-spun and cured vinyltriacetoxysilane-based
adhesion promoter films on silicon are presented. The use of these measurements
in assisting chemistry studies of adhesion promoters for electronics applications
is discussed.
10.1021/jp050201v CCC: © 2005 American Chemical Society