Contact Info

Adam P. Hitchcock

Canada Research Chair

in Materials Research
McMaster University
Hamilton, ON
Canada L8S 4M1
V: +1 905 525-9140
F: +1 905 521-2773



in situ electrochemical STXM with flow: Cu electrodeposition

WHO:  Vinod Prabu, Adam Hitchcock, Chemistry and Chemical Biology, BIMR, McMaster University            

WHERE:  Canadian Light Source Scanning Transmission X-ray Microscope (STXM)
WHEN:  Oct-2016, Jan 2017                        POSTED:  26 Jun 2017

WHAT: Cu electrodeposition and stripping studied by in situ electrochemical STXM with electrolyte FLOW

Frame from movie correlating cyclic voltammetry and chemical mapping derived from 3 STXM images at the Cu 2p (L3) edge measured repeatedly. Potential scan rate was 5 mV/s.

Click on the image or link to movie in multi-gif or mp4 format.




In collaboration with Norcada Inc, Martin Obst (U. Bayreuth), Sarah Harmer--Bassell (Adelaide U) and Jian Wang (CLS), we have designed, built and commissioned the phase 1b system for in situ flow electrochemistry. Here results from the Jan 2017 CLS a-STXM study of Cu deposition and stripping from a 10 mM, 0.1 M CuSO4 solution are presented as a movie correlating the current-voltage changes in 3-cycles of a continuous cyclic voltammogram (5 mV/s) and chemical maps of the working electrode derived from 3-energy imaging at the Cu 2p edge. The continuous flow helped stabilize the cell performance by replensishing electrolyte which otherwise would be locally depleted due to irreversible dendrite formation.

Details of the in situ flow electrochemical cell and its assembly are given in this movie.

Publication: V. Prabu et al, Langmuir (in preparation)


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